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为了适应器件的小型化、提高薄膜两相复合磁电材料的磁电效应,采用磁控溅射方法在Pb(Mg1/3Nb2/3)O3-PbTiO3(PMN-PT)衬底上生长FeCoV薄膜和Ni薄膜,形成FeCoV/PMN-PT/Ni薄膜复合结构.采用动态磁电系数测量系统对复合结构的磁电性能和共振频率进行了研究.结果表明:复合结构的磁电系数随直流偏置场的增加呈现先增加后减小的趋势,在约39.8 kA/m附近达到峰值17.8×10-3 mV·cm-1·A·m-1,在31.84 kA/m的直流偏置场下,磁电电压随着交流激励场强度的增加呈线性增加.复合结构在85.5 kHz下具有一个明显的共振峰,在共振频率下,磁电性能提高5倍以上.

参考文献

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